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PlasCalc Plasma Monitoring & Control

The PlasCalc Plasma Monitoring System measures plasma emission from 200-1100 nm in only 3 milliseconds. The PlasCalc benefits from advanced process control systems and sophisticated algorithms for data acquisition.

The PlasCalc-2000 is available for $15698.

Features

1.0 nm (FWHM) optical resolution
200-1100 nm range
Rapidly build and save experiment methods

Recipe Editor

The Recipe Editor tool allows you to easily and rapidly configure, build and save experiment methods. It is easy to build robust recipes for the most difficult plasma processes such as measuring film deposition, monitoring plasma etching, examining surface cleaning, analyzing plasma chamber health control and monitoring abnormal pollution or discharge phenomena.

Multiple Tools for Easy Plasma Diagnosis

PlasCalc comes with operating software. The Integrated Formula Editor provides easy access to a full range of mathematical and algorithmic functions. An optional Emission Wavelength Library, available for a separate price, provides species identification, while the Wavelength Editor allows you to optimize signal-to-noise. A dual-window interface shows the actual spectrum and all process control information.

PlasCalc Specifications

Spectral range:	200-1100 nm
Optical resolution:	1.0 nm (FWHM)
D/A converter:	14 bit
Digital Input/Output:	8 x TTL
Analog Output:	4 x [0-10V]
Interface:	USB 1.1
Power consumption:	12 VDC @ 1.25 A
Power requirements:	90-240 VAC 50/60 Hz
Dimensions:	257 mm x 152 mm x 263 mm
Weight:	5 kg

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