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| The Ocean Thin Films Process | ||
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The production of a patterned optical multi-layer coated element begins with application of photoresist to the surface. To generate a pattern, we align the mask and then expose and develop the photoresist. This creates a resist pattern on the coating surface. Next, the prepared substrates are placed into a vacuum chamber for controlled deposition of the multi-layer coating. After deposition of the filter, the patterned coating is rinsed in solvent, which removes any unwanted layers and leaves the desired patterned filter coating. This sequence can be repeated as needed, allowing multiple filters to be deposited. |
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